Potassium hydroxide is frequently used, especially in the chemical industry. I think you are not very familiar with the characteristics of this material. The following is a brief introduction to the relationship between this material and micro arc oxidation of magnesium alloy. Let's look at it together:

減小微弧氧化時(shí)，金屬表面出現(xiàn)微小弧光所需的電壓與電解液的電導(dǎo)率有直接關(guān)系。電解液的電導(dǎo)率越大，等離子體中的帶電粒子在微弧氧化時(shí)形成的“金屬一電介質(zhì)一氣體一電解液”四相體系中的傳遞和遷移更快，更有效，表面有膜層易被擊穿而出現(xiàn)放電弧光，因而達(dá)到擊穿電壓所需的外加電壓越低。

When the micro arc oxidation is reduced, the voltage required for the micro arc on the metal surface is directly related to the conductivity of the electrolyte. The greater the conductivity of electrolyte is, the faster the transfer and migration of charged particles in the four phase system of "metal dielectric gas electrolyte" formed by microarc oxidation is, the more effective it is. The film on the surface is easy to be broken down and the discharge arc appears, so the lower the applied voltage required to reach the breakdown voltage is.

Na2SiO3溶液中添加不同濃度氫氧化鉀所獲得的微弧氧化膜層厚度的變化曲線。膜層厚度隨其濃度的增大而增加，但產(chǎn)品濃度增大到一定程度（≥1 .5g/L）時(shí)，膜層厚度增加趨勢(shì)減緩，甚不再增加。這可能是由于隨產(chǎn)品濃度增大，膜層生長(zhǎng)速率增加的同時(shí)，生成的膜層在其作用下的溶解速率也相應(yīng)增加，從而導(dǎo)致膜層厚度不再增加。

The change curve of the thickness of micro arc oxidation film obtained by adding different concentration of potassium hydroxide in Na2SiO3 solution. The film thickness increases with the increase of its concentration, but when the product concentration increases to a certain extent (≥ 1.5g / L), the increasing trend of film thickness slows down, or even no longer increases. This may be due to the increase of the film growth rate with the increase of the product concentration, and the corresponding increase of the dissolution rate of the generated film under the action of the product concentration, so that the film thickness is no longer increased.

此外，還可發(fā)現(xiàn)，Na2SiO3溶液中不含KOH（即KOH濃度為零）時(shí)也能正常進(jìn)行微弧氧化反應(yīng)并成膜，說明KOH對(duì)AZ91C鎂合金微弧氧化時(shí)具體的氧化成膜反應(yīng)并無貢獻(xiàn)，氫氧化鉀的加入只是改變了溶液的成分和性質(zhì)，影響到微弧氧化反應(yīng)的過程，從而影響成膜的速率。

In addition, it can be found that Na2SiO3 solution without KOH (i.e. KOH concentration is zero) can also be subject to the normal micro arc oxidation reaction and film formation, which shows that KOH has no contribution to the specific micro arc oxidation reaction of az91c magnesium alloy. The addition of KOH only changes the composition and properties of the solution, affects the process of micro arc oxidation reaction, and thus affects the film formation rate.

通過以上文中講解的內(nèi)容，大家可以了解到氫氧化鉀物質(zhì)與鎂合金微弧氧化的關(guān)系，希望文中講解的知識(shí)點(diǎn)對(duì)大家有幫助作用，在以后的操作和使用這種物質(zhì)時(shí)，多注意這方面的問題。

Through the above content, you can understand the relationship between potassium hydroxide and micro arc oxidation of magnesium alloy. I hope that the knowledge points explained in this paper will be helpful to you. In the future operation and use of this material, pay more attention to this problem.